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- Huffmaster Sees Value in Chemical Sector Security Summit
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- Lawmakers Dodge Responsibility in Security Legislation
- SOCMA Members Visible at 2010 Chemical Sector Security Summit
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- SOCMA welcomes president’s call to permanently extend R&D tax credit - http://bit.ly/1xvrLT
today at 2:55 PM - New in the SOCMA Blog: changing Japanese chemical laws could affect U.S. companies http://bit.ly/cQjxND
5 days ago - From @ChemicalWeek - SOCMA member Novolyte forms electrolyte joint venture with Seoul co. Foosung http://bit.ly/aSdVLx
6 days ago
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SOCMA Members Visible at 2010 Chemical Sector Security Summit
Posted: 07/15/10 at 5:57 PMSOCMA members and leadership are always highly involved in the Chemical Sector Security Summit and Expo as speakers and exhibitors, and this year was no exception.
New SOCMA member Huffmaster at their booth in the summit expo hall
Clyde Miller of BASF speaks during a panel discussion on background checks
In addition, SOCMA President & CEO Lawrence D. Sloan delivered the summit's welcoming remarks and Acting Deputy Assistant Secretary Sue Armstrong of the Department of Homeland Security Office of Infrastructure Protection was interviewed for a SOCMA podcast on current chemical security enforcement and compliance efforts. For a photo gallery, presentation slides and a full recap of the event, visit SOCMA's website.
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Government Blogs
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- Leadership Journal (DHS)
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